Invited speakers

M. Bilek, University of Sydney, Australia
"Synchronised external magnetic fields applied in HiPIMS enhance plasma generation in the race track as well as plasma transport to the substrate"

H. Gerdes, Fraunhofer IST, Germany
"Reactive HIPIMS and process control on industrial scale coating systems"

J. Greene, University of Illinois, USA
"Fundamental properties of TM nitrides: Materials design strategies for extreme properties"

E. Kusano, Kanazawa Institute of Technology, Japan
"Model calculation and visualization of time-dependent reactive gas mass balance change in Ti-O₂ reactive sputtering"

J.-W. Lee, Ming Chi University of Technology, Taiwan
"Improvement of deposition rate of high power impulse magnetron sputtering system using hybrid and superimposition approaches"

D. Lundin, Université Paris-Sud, France
"Key features of reactive high power impulse magnetron sputtering"

L. Martinu, Polytechnique Montreal, Canada
"Durable smart and multifunctional optical coatings for energy saving and anticounterfeiting - New opportunities for pulsed reactive plasmas"

C. Mitterer, Montanuniversität Leoben, Austria
"Reactive and non-reactive sputter deposition of MoOx thin films"

I. Petrov, University of Illinois, USA
"Control of micro- and nanostructure in transition metal nitrides and borides: Recent advances"

J. M. Schneider, RWTH Aachen University, Germany
"Quantum mechanically guided material design and experimentally guided quantum mechanical calculations"

K. Strijckmans, Ghent University, Belgium
"Reactive HiPIMS through the eyes of a 'simple' model"

J. Vyskočil, HVM Plasma, Czech Republic
"Industrial challenges and applications of reactively sputtered hard coatings"